Microelectronic substrate cleaning compositions

Details Microelectronic substrate cleaning compositions Microelectronic substrate cleaning compositions

C - Chemistry, Metallurgy

09

D

C09D 9/00 (2006.01)

Patent

CA 2716641

A microelectronic cleaning compositions of: a) from about 80 % to about 99 % by weight of the composition of at least one organic sulfone; b) from about 0.5 % to about 19 % by weight of the composition of water; and c) from about 0.5 % to about 10 % by weight of the composition of at least one component providing tetrafluoroborate ion, and d) optionally at least one polyhydric alcohol. is especially useful to clean etch/ash residues from microelectronic substrates or device having both Si-based anti-reflective coatings and low-k dielectrics.

L'invention porte sur des compositions de nettoyage de substrats micro-électroniques formées pour : a) environ 80 % à environ 99 % en poids de la composition d'au moins un sulfone organique ; b) environ 0,5 % en poids à environ 19 % en poids de la composition d'eau ; et c) environ 0,5 % à environ 10 % en poids de la composition d'au moins un composant fournissant un ion tétrafluoroborate, et d) facultativement au moins un alcool polyvalent sont particulièrement utiles pour nettoyer des résidus d'attaque chimique/cendre à partir de substrats ou dispositifs micro-électroniques ayant à la fois des revêtements anti-reflets à base de Si et des diélectriques à faible permittivité.

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