Microprocessing of synthetic quartz glass substrate

Details Microprocessing of synthetic quartz glass substrate Microprocessing of synthetic quartz glass substrate

C - Chemistry, Metallurgy

03

C

C03C 15/00 (2006.01) B81B 7/02 (2006.01) B81C 1/00 (2006.01) C03C 17/28 (2006.01)

Patent

CA 2700114

In a process for microprocessing a synthetic quartz glass substrate by wet etching, an organic coating layer of silane or silazane is formed on the substrate, and a photoresist film is formed on the organic coating layer, prior to the wet etching.

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