G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/00 (2006.01) B41M 3/14 (2006.01) B42D 15/00 (2006.01) G02B 5/30 (2006.01)
Patent
CA 2573328
This invention relates to an improved process for the nano- or microstructuring of a substrate by applying a mesogen or a mesogenic mixture on top of the substrate. The improvement is that the mesogen or mesogenic mixture is contact printed unto the target substrate, said substrate having an alignment layer.
L'invention concerne un procédé amélioré destiné à la nano ou microstructuration d'un substrat par application d'un mésogène ou d'un mélange mésogénique sur la surface du substrat. L'amélioration réside dans le fait que le mésogène ou le mélange mésogénique est un tirage contact sur le substrat cible, ce substrat possédant une couche d'alignement.
Bastiaansen Cornelis Wilhelmus Maria
Broer Dirk
Sanchez Carlos
Verbakel Frank
Smart & Biggar
Stichting Dutch Polymer Institute
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