C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
204/96, 204/96.2
C23C 16/50 (2006.01) B05D 7/24 (2006.01) C23C 16/18 (2006.01) C23C 16/509 (2006.01)
Patent
CA 2026979
Precision multilayer optical interference coating of substrates having complex topology using complementary shaped electrodes and plasma enhanced chemical vapor deposition within a chamber. The materials for the optical quality thin films are obtained from starting reactants of the form M-R where M denotes a metal atom and R denotes an organic component. These vapor phase starting reactants are brought into a reactive atmosphere of the chamber through a plurality of orifices in one of the shaped electrodes. The resulting substances are deposited as thin films upon the substrates with inherently superior scatter loss performance because of the low temperature nature and simple direct vapor-to-solid phase transformation pith of the process.
Honeywell Inc.
Smart & Biggar
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