G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/42 (2006.01)
Patent
CA 2753399
A cleaning composition for cleaning microelectronic or nanoelectronic devices, the cleaning composition having HF as the sole acid and sole fluoride compound in the composition, at least one primary solvent selected from the group consisting of sulfones and selenones, at least one polyhydroxyl alkyl or aryl alcohol co- solvent having metal ion complexing or binding sites, and water, and optionally at least one phosphonic acid corrosion inhibitor compound and wherein said cleaning composition is free of amines, bases and other salts.
L'invention porte sur une composition de nettoyage pour nettoyer des dispositifs microélectroniques ou nanoélectroniques, la composition de nettoyage ayant de l'acide fluorhydrique comme seul acide et seul composé fluorure dans la composition, au moins un solvant primaire choisi dans le groupe constitué par les sulfones et les sélénones, au moins un co-solvant à base d'alcool polyhydroxyle alkyle ou aryle ayant des sites de complexion ou de liaison d'ions métalliques, et de l'eau, et facultativement au moins un composé inhibiteur de la corrosion par acide phosphonique, et ladite composition est exempte d'amines, de bases et d'autres sels.
Gemmill William R.
Hsu Chien-Pin S.
Westwood Glenn
Avantor Performance Materials Inc.
Osler Hoskin & Harcourt Llp
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