Nanostructure material, method for the preparation thereof

Details Nanostructure material, method for the preparation thereof Nanostructure material, method for the preparation thereof

C - Chemistry, Metallurgy

01

B

C01B 31/00 (2006.01) H01M 4/133 (2010.01) C01D 15/02 (2006.01) C01G 31/02 (2006.01)

Patent

CA 2584231

The invention relates to a nanostructured material. Said material is a nanostructured carbon material consisting of agglomerates of small needles of Li1+aV3O8 and ßLixV2O5 (0,l<= .alpha. <= 0,25 et 0,03 <= x <= 0,667 surrounded by a discontinuous coating of spherical carbon particles. It is obtained by means of a process consisting in preparing a carbon precursor gel by bringing carbon, V2O5- .alpha. an a Li precursor into contact with each other, the amounts thereof being such that the ratio of concentrations [V2O5]/[Li] ranges from 1.15 to 1.5, and the mass ratio (carbon)/ (carbon + V2O5+ Li precursor) is 10 to 15, and in subjecting the gel to heat treatment including a first stage at 8O0C - 15O0C pendant 3-12 h, and a second stage between 3000C and 35O0C, during 10 mins to 1 hour, in a nitrogen or argon atmosphere. n. Applications: positive-electrode active material.

L'invention concerne un matériau nanostructuré . Le matériau est un matériau carboné nanostructuré constitué par des agglomérats de petites aiguilles de Li1+.alpha.V3O8 et de ~LixV2O5 (0,l<= .alpha. <= 0,25 et 0,03 <= x <= 0,667 entourées par une couche discontinue de particules sphériques de carbone. Il est obtenu par un procédé consistant à préparer un gel précurseur carboné par mise en contact de carbone, de V2O5- .alpha. et d'un précurseur de Li, en quantités telles que le rapport des concentrations [V2O5]/[Li] soit compris entre 1,15 et 1,5, et que le rapport en masse (carbone)/ (carbone + V2O5+précurseur de Li) soit de 10 à 15, et à soumettre le gel à un traitement thermique comprenant une lère étape à 8O0C - 15O0C pendant 3-12 h, et une 2ème étape entre 3000C et 35O0C, pendant 10 min à 1 heure, sous atmosphère d'azote ou d' argon. Applications : matière active d'électrode positive.

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