Negative-working photoresist composition for use on a...

G - Physics – 03 – C

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96/217, 96/78

G03C 1/66 (2006.01) G02B 3/00 (2006.01) G03B 21/62 (2006.01) G03F 7/04 (2006.01) H01J 9/227 (2006.01)

Patent

CA 1217079

PHA.60047 17 6.3.84 ABSTRACT: A negative-working photoresist composition for use on a polymethyl methacrylate surface. A method is shown in which a black, light- absorbing matrix is formed on the viewing surface of a rear-projection polymethyl methacrylate TV viewing screen in which there is use of a negative working photoresist composition comprising an aqueous solution of polyvinyl alcohol, a water-soluble dichromate and acetone as essentially the sole wetting agent.

461695

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