C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 233/54 (2006.01) C07K 5/06 (2006.01) A61K 7/48 (1995.01)
Patent
CA 2273989
The invention relates to new histidine derivatives which correspond to general formula (I), wherein: R denotes an alkyl radical, linear or ramified, saturated or unsaturated, with from 6 to 22 carbon atoms, n is a whole from 1 to 16, Q?+¿ represents H?+¿ or an organic or mineral cation, and addition salts with an acid. The invention equally concerns a process for preparing the compounds in the formula (I) and the user of these compounds in the cosmetics and pharmaceutical industries.
L'invention concerne de nouveaux dérivés d'histidine répondant à la formule générale (I), dans laquelle: R désigne un radical alkyle, linéaire ou ramifié, saturé ou insaturé, ayant de 6 à 22 atomes de carbone, n est un entier allant de 1 à 16, Q+ représente H+ ou un cation organique ou minéral, et les sels d'addition avec un acide. L'invention concerne également un procédé de préparation des composés de formule (I) ainsi que l'utilisation de ces composés en cosmétique et en pharmacie.
Bordier Thierry
Philippe Michel
L'oreal
Robic
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