Non-aqueous photoresist stripper that inhibits galvanic...

G - Physics – 03 – F

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G03F 7/42 (2006.01) C11D 3/37 (2006.01) C11D 11/00 (2006.01)

Patent

CA 2605236

Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous, non-corrosive cleaning compositions that resist galvanic corrosion when used on stacked layer structures of different types of metals at a surface of an electronic device. Such non-aqueous photoresist strippers and cleaning compositions comprise: (a) at least one polar organic solvent, (b) at least one di or polyamine having both at least one primary amine group and one or more secondary and/or tertiary amine groups, and having the formula wherein R1, R2, R4, and R5 can be independently selected from H, OH, hydroxyalkyl and aminoalkyl groups; R6and R7 are each independently H or alkyl groups, and m and n are each independently integers of 1 or larger, with the proviso that R1, R2, R4, and R5 are selected so that there is at least one primary amine group and at least one secondary or tertiary amine group in the compound, and (c) at least one corrosion inhibitor that is selected from 8- hydroxyquinoline and isomers thereof, benzotriazoles, catechol, monosaccharides, and polyhydric alcohols selected from mannitol, sorbitol, arabitol, xylitol, erythritol, alkane diols and cycloalkane diols.

Les compositions photorésistantes décapantes et nettoyantes selon l'invention consistent en des compositions nettoyantes non aqueuses et non corrosives, résistantes à la corrosion galvanique lorsqu'elles sont utilisées sur des structures à couches superposées de différents types de métaux à la surface d'un dispositif électronique. De telles compositions photorésistantes décapantes et nettoyantes comprennent : (a) au moins un solvant organique polaire, (b) au moins une di ou polyamine ayant à la fois au moins un groupe amine primaire et un ou plusieurs groupes amine secondaire et/ou tertiaire, de formule R?6#191 | R?1#191R?2#191N ~~[(C)?m#191 ~~ N]?n#191 ~~ R?4#191R?5#191 | R?7#191 où R?1#191, R?2#191, R?4,#191 et R?5#191 peuvent être indépendamment choisis parmi H, OH, les groupes hydroxyalkyles et aminoalkyles ; R?6#191 et R?7#191 sont chacun indépendamment H ou des groupes alkyles, et m et n sont chacun indépendamment des entiers égaux ou supérieurs à 1, à condition que R?1#191, R?2#191, R?4#191, et R?5#191 soient choisis de façon à ce qu'il y ait au moins un groupe amine primaire et au moins un groupe amine secondaire ou tertiaire dans le composé, et (c) au moins un inhibiteur de corrosion choisi parmi la 8-hydroxyquinoline et ses isomères, les benzotriazoles, le catéchol, les monosaccharides, et les alcools polyhydriques sélectionnés parmi le mannitol, le sorbitol, l'arabitol, le xylitol, l'érythritol, les alcane diols et les cycloalcane diols.

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