One-step process for purifying an inert gas

Details One-step process for purifying an inert gas One-step process for purifying an inert gas

C - Chemistry, Metallurgy

01

B

23/341

C01B 21/04 (2006.01) B01D 53/02 (2006.01) B01J 23/755 (2006.01) C01B 23/00 (2006.01)

Patent

CA 1266163

ABSTRACT OF THE DISCLOSURE There is disclosed a one-step process for purifying an inert gas achieved by contacting the inert gas including minute quantities of an impurity selected from the group consisting of CO, CO2, O2, H2, H2O and mixtures thereof with a particulate material comprised of nickel in an amount of at least about 5% by weight as elemental nickel distributed over an effective area of surface, typically from about 100 to 200 m2/g, thereby forming an inert gas having less than 1 ppm and preferably less than 0.1 ppm of any such impurity.

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