C - Chemistry – Metallurgy – 03 – C
Patent
C - Chemistry, Metallurgy
03
C
117/85
C03C 17/09 (2006.01) C03B 37/014 (2006.01) C03B 37/027 (2006.01)
Patent
CA 1130660
J. Irven-14 -11- (Revision) ABSTRACT OF THE DISCLOSURE A vapor reaction deposition process is used to form a localized deposit upon the end face of a rod wherein by means of relative movement the position of the localized deposit is scanned over the end face of the rod and at the same time the reaction is progressively changed so as to cause the deposit building up on the end face to have a radially graded refractive index profile. SBG/mmg Date: May 2, 1979
327435
Irven John
Smart & Biggar
Stc Plc
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