Passive gas flow management and filtration device for use in...

H - Electricity – 01 – S

Patent

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H01S 3/22 (2006.01) H01S 3/223 (2006.01)

Patent

CA 2532810

The present invention provides systems and methods for filtering particles and assisting gas flow management within laser systems. In one embodiment, a laser apparatus (100) includes an elongate laser chamber defining a chamber cavity (130) and an electrode structure (140) disposed therein. The electrode structure includes an anode (148) spaced apart from a cathode (146). The laser includes an elongate baffle (174) disposed in the laser chamber. The baffle is adapted to arrest a plurality of particles generated within the chamber. In this manner, the baffle operates as a passive filtration system to help filter particles generated within the chamber during laser operation, and may further provide gas flow management capabilities.

L'invention concerne des systèmes et des procédés permettant de filtrer des particules et de faciliter la gestion d'un écoulement gazeux dans des systèmes laser. Dans un mode de réalisation, l'appareil laser (100) comprend une chambre allongée définissant une cavité de chambre (130) et une structure d'électrodes (140) disposée dans ladite chambre. La structure d'électrodes comprend une anode (148) espacée d'une cathode (146). Le laser comprend chicane allongée (174) disposée dans la chambre laser. Ladite chicane est conçue pour arrêter les particules multiples générées dans la chambre. De cette façon, la chicane fonctionne comme une système de filtration passif destiné à filtrer les particules générées dans la chambre pendant le fonctionnement du laser et peut également présenter des capacités de gestion d'écoulement gazeux.

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