Patterning of semiconductive polymers

Details Patterning of semiconductive polymers Patterning of semiconductive polymers

C - Chemistry, Metallurgy

08

J

C08J 7/14 (2006.01) C07C 43/205 (2006.01) C07C 43/225 (2006.01) C08G 61/00 (2006.01) C08G 61/02 (2006.01) C08G 61/12 (2006.01) C09K 11/06 (2006.01) G03F 7/16 (2006.01) G03F 7/26 (2006.01) H01B 1/12 (2006.01) H01L 33/00 (2006.01) H01L 51/30 (2006.01) H05B 33/14 (2006.01) H01L 51/50 (2006.01) H01L 51/56 (2006.01)

Patent

CA 2089481

ABSTRACT PATTERNING OF SEMICONDUCTIVE POLYMERS A method is provided for forming in a semiconductive conjugated polymer at least first and second regions having different optical properties. The method comprises: forming a layer of a precursor polymer and permitting the first region to come into contact with a reactant, such as an acid, and heat while permitting the second region to come into contact with a lower concentration of the reactant. The reactant affects the conversion conditions of the precursor polymer in such a way as to control the optical properties of at least the first region so that the optical properties of the first region are different from those of the second region. The precursor polymer may comprise a poly(arylene-l, 2-ethanediyl) polymer, at least some of the ethane groups of which include a modifier group whose susceptibility to elimination is increased in the presence of the reactant.

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