C - Chemistry – Metallurgy – 23 – G
Patent
C - Chemistry, Metallurgy
23
G
C23G 1/14 (2006.01) C11D 1/66 (2006.01) C11D 3/02 (2006.01) C11D 3/30 (2006.01) H01L 21/306 (2006.01) H01L 21/64 (2006.01)
Patent
CA 2146036
Aqueous alkaline cleaning solutions for cleaning microelectronic substrates and maintaining substrate surface smoothness comprise a metal ion free base, a nonionic surfactant and a component to reduce or control the pH of the cleaning solution to a pH within the range of from about pH 8 to about pH 10.
Dailey Gary G.
Ilardi Joseph M.
Schwartzkopf George
Avantor Performance Materials Inc.
Osler Hoskin & Harcourt Llp
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