Ph adjusted nonionic surfactant-containing alkaline cleaner...

C - Chemistry – Metallurgy – 23 – G

Patent

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Details

C23G 1/14 (2006.01) C11D 1/66 (2006.01) C11D 3/02 (2006.01) C11D 3/30 (2006.01) H01L 21/306 (2006.01) H01L 21/64 (2006.01)

Patent

CA 2146036

Aqueous alkaline cleaning solutions for cleaning microelectronic substrates and maintaining substrate surface smoothness comprise a metal ion free base, a nonionic surfactant and a component to reduce or control the pH of the cleaning solution to a pH within the range of from about pH 8 to about pH 10.

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