C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/228, 260/295
C07D 213/63 (2006.01) A61K 31/44 (2006.01) C07D 213/68 (2006.01) C07D 213/73 (2006.01) C07D 213/75 (2006.01) C07D 213/89 (2006.01)
Patent
CA 2020088
- 1 - ABSTRACT OF THE DISCLOSURE The present invention relates to compounds of the formula Image where n is 0 or 1; X is hydrogen, loweralkyl, loweralkoxy, halogen, formyl, loweralkylcarbonyl, loweralkoxycarbonyl, loweralkoxycarbonylloweralkyl or hydroxymethyl; Y is hydrogen or halogen, Z is NO2 or NHR, were R is hydrogen, loweralkyl, arylloweralkyl or loweralkylcarbonyl, and to a process for their preparation. The compounds are useful as topical antiinflammatory agents for the treatment of various dermatoses.
Davis Larry
Effland Richard C.
Klein Joseph T.
Olsen Gordon E.
Bereskin & Parr
Davis Larry
Effland Richard C.
Hoechst-Roussel Pharmaceuticals Inc.
Klein Joseph T.
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