C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/218, 260/254
C07D 403/06 (2006.01) C07D 239/96 (2006.01)
Patent
CA 1248102
NOVEL PHENYLPIPERAZINE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME Abstract of the Disclosure: Phenylpiperazine derivatives of the formula: Image (I) wherein R1 is a hydrogen atom or a straight- or branched- chain saturated or unsaturated alkyl group having 1 to 8 carbon atoms which may be substituted at any position by a hydroxyl group, a carboxyl group, a lower alkoxycarbonyl group or an oxo group; and R2 is a hydrogen atom, a halogen atom, a lower alkyl group or a sulfamoyl group, and a process for producing the same are disclosed. The deriva- tives of the formula have alpha blocking and serotonin antagonizing activities and are useful as a drug.
423221
Hata Shun-Ichi
Kubodera Noboru
Matsunaga Isao
Nabata Hiroyuki
Nagano Hiroyuki
Chugai Seiyaku Kabushiki Kaisha
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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