C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/223, 260/267
C07D 295/14 (2006.01) A61K 31/495 (2006.01) C07D 295/13 (2006.01) C07D 317/68 (2006.01) C07D 405/12 (2006.01)
Patent
CA 1244431
NOVEL PHENYLPIPERAZINE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME Abstract of the Disclosure: Compounds of the formula Image (wherein R1 is a lower alkyl group, R2, R3 and R4, which may be the same or different, represent a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxy group, a hydroxyl group, a trifluoromethyl group or a lower alkoxy- carbonyl group; two adjacent-groups of R2, R3 and R4 may combine to form a methylenedioxy group; n is an integer of 2 to 6) or salts thereof, are disclosed. These compounds are useful as agents for treating circulatory diseases because they have hypotensive action and are capable of increasing the cerebral blood flow, decreasing the heart rate and suppressing ventricular arrhythmia due to myocardial ischemia.
436782
Hata Shun-Ichi
Kubodera Noboru
Matsunaga Isao
Nabata Hiroyuki
Nagano Hiroyuki
Chugai Seiyaku Kabushiki Kaisha
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
LandOfFree
Phenylpiperazine derivatives and process for producing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Phenylpiperazine derivatives and process for producing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phenylpiperazine derivatives and process for producing the same will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1170084