Photo-mask

Details Photo-mask Photo-mask

G - Physics

11

B

356/166

G11B 7/26 (2006.01) G03F 1/00 (2006.01) G03F 1/14 (2006.01)

Patent

CA 1315023

3825 - 14 - ABSTRACT OF THE DISCLOSURE A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.

578870

Affiliated with

Also associated with

Rating

Photo-mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photo-mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photo-mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1316295