C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 309/72 (2006.01) G03F 7/004 (2006.01) G03F 7/031 (2006.01)
Patent
CA 2164048
Radiation-sensitive compositions which are especially useful in Deep UV radiation photo- lithographic processes containing (a) a polymeric material sensitive to acid and (b) a photoacid generating composition that results in generation of an acidic moiety as a result of irradiation and is represented by formula (I): (I) Image wherein R1, R2, and R3 are individually selected from the group consisting of hydrogen and lower alkyl group having 1-4 carbon atoms; wherein R4 and R5 are individually selected from the group consisting of CF3 and NO2 with the proviso that R4 and R5 cannot both be CF3; wherein R6, R7, and R8 are individually selected from the group consisting of hydrogen and lower alkyl group having 1-4 carbon atoms; and wherein R9 and R10 are individually selected from the group consisting of CF3, NO2, and SO3R wherein R is selected from the group consisting of unsubstituted or substituted alkyl or aryl groups wherein the substituents are selected from the group consisting of lower alkyl or lower alkoxy groups consisting of 1-4 carbon atoms, NO2 and CF3.
Ocg Microelectronic Materials Inc.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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