C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 2/50 (2006.01) C08F 4/00 (2006.01) C08G 59/68 (2006.01) C08J 3/28 (2006.01) C09D 7/12 (2006.01) G03F 7/038 (2006.01)
Patent
CA 2224441
Compounds of formula I, II or III Image Image Image , wherein X is a divalent radical; Y is C1-C6alkylene, cyclohexylene or a direct bond; Ar1 is an aromatic radical as defined in claim 1, R1 and R2 are each independently the other, inter alia, a radical of formula Image , in which p is zero or 1, or a radical of formula Image , R3 is, inter alia, hydrogen, C1-C12alkyl, C5-C12cycloalkyl or phenyl-C1-C3alkyl;R4 is, inter alia, C1-C12alkyl, C5-C12cycloalkyl, phenyl-C1-C3alkyl or phenyl; or an acid addition salt of a compound of formula 1, II or III; are useful as photosensitive base catalysts in base crosslinking compositions.
Composés de formules I, II ou III Image Image Image , où : X est un radical divalent; Y est un alkylène C1-C6, un cyclohexylène ou une liaison directe; Ar1 est un radical aromatique, tel que défini dans la revendication 1; R1 et R2 sont chacun indépendamment l'un de l'autre, entre autres, un radical de formule Image , dans lequel p est 0 ou 1, ou un radical de formule Image ; R3 est, entre autres, un hydrogène, un alkyle C1-C12, un cycloalkyle C5-C12 ou un phénylalkyle C1-C3; R4 est, entre autres, un alkyle C1-C12, un cycloalkyle C5-C12, un phénylalkyle C1-C3 ou un phényle. L'invention porte aussi sur les sels d'addition avec un acide des composés de formules I, II ou III. Tous ces composés et sels sont utiles comme catalyseurs photosensibles dans des compositions de réticulation.
Birbaum Jean-Luc
Kimura Akira
Kunz Martin
Kura Hisatoshi
Nakashima Hiroko
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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