C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
96/2, 400/3012
C08L 51/08 (2006.01) C08F 285/00 (2006.01) G03F 7/00 (2006.01) G03F 7/033 (2006.01)
Patent
CA 2019366
Abstract Photopolymerizable mixture and recording material produced therefrom The invention discloses a photopolymerizable mixture which contains, as essential constituents a) a graft copolymer having a polyurethane as the graft backbone, onto chains containing vinyl alcohol units and vinyl acetal units are grafted, b) a free-radically polymerizable compound possessing at least one terminal ethylenically unsaturated group and having a boiling point of more than 100 °C at normal pressure, and c) a compound or a combination of compounds which under the action of actinic light is capable of initiating the polymerization of compound b). The mixture is suitable for use in the production of printing plates and photoresists. It is distinguished by high photospeed and can be developed with aqueous solutions. It yields printing plates producing large print runs.
Kroggel Matthias
Mohr Dieter
Mueller-Hess Waltraud
Rauterkus Karl-Josef
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
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