C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/290.1, 260/2
C07D 213/89 (2006.01) C07D 237/08 (2006.01) C07D 405/12 (2006.01) C07F 9/58 (2006.01) G03F 7/025 (2006.01) G03F 7/027 (2006.01)
Patent
CA 1297482
ABSTRACT OF THE DISCLOSURE: Disclosed are a novel, photoreactive compounds which have advantageous properties, in particular high photoreactivity and good photosensitivity over a wide spectral wavelength range, and whose property spectrum can be altered to a great extent, the compounds therefore possessing a broad and varied range of possible uses, especially for the production of coatings or protective layers and in optical information fixing. These compounds are of formulae: Image (I) Image (II) where X is: Image R1, R4 and R6 are organic radicals which may contains heteroatoms; R2 unsaturated radical containing one or more aliphatic multiple bonds; R3 is hydrogen or an electron donor or electron acceptor group; R5 is H, alkyl or aryl; R7 is alkyl, alkoxy, aryl, halogen or hydroxyl; and m and n are equal to 1,2 or 3.
514626
Boettcher Andreas
Koch Horst
Loerzer Thomas
Schulz Guenther
Schwalm Reinhold
Basf Aktiengesellschaft
Boettcher Andreas
Koch Horst
Loerzer Thomas
Robic
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