Photoresist composition comprising cyclohexyleneoxyalkyl...

Details Photoresist composition comprising cyclohexyleneoxyalkyl... Photoresist composition comprising cyclohexyleneoxyalkyl...

G - Physics

03

F

96/150

G03F 7/027 (2006.01)

Patent

CA 1330737

PHOTORESIST COMPOSITION COMPRISING CYCLOHEXYLENEOXYALKYL ACRYLATES ABSTRACT A flexible and nonbrittle negative-working photoresist composition comprises a polymeric binder, a photoinitiator composition, and a polymerizable cyclohexyleneoxyalkyl acrylate monomer characterized by the structural formula: Image wherein R is H or CH3, a is an integer of from 1 to 10 and b is 1 or 2.

568761

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