Photoresist compositions

Details Photoresist compositions Photoresist compositions

G - Physics

03

F

96/150

G03F 7/004 (2006.01) G03F 7/039 (2006.01)

Patent

CA 1333536

Spin castable radiation sensitive compositions are provided by forming an organic solvent solution of a novolak resin, an organic polymer having chemically combined acid labile groups, and an aryl onium salt.

561109

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