Photoresist strippers containing reducing agents to reduce...

G - Physics – 03 – F

Patent

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Details

G03F 7/32 (2006.01) C23F 11/10 (2006.01) G03F 7/42 (2006.01)

Patent

CA 2132768

Alkaline photoresist stripping compositions containing reducing agent to reduce or inhibit metal corrosion. Reducing agents include compounds containing reactive multiple bonds; hydrazine and derivatives thereof, oximes, hydroquinone, pyrogallol, gallic acid and esters thereof, tocopherol, 6-hydroxy-2,5,7,8-tetramethylchroman-2-carboxylic acid, BHT, BHA, 2,6-di-tert-butyl-4-hydroxymethyl-phenol, thiols, salicylaldehyde, 4-hydroxybenzaldehyde and glycol aldehyde dialkylacetals.

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