Photosensitive mixture

Details Photosensitive mixture Photosensitive mixture

G - Physics

03

F

96/150

G03F 7/028 (2006.01) G03F 7/027 (2006.01) G03F 7/038 (2006.01) G03F 7/26 (2006.01)

Patent

CA 2028541

Liquid mixtures containing a) 5-25 % by weight of a monomeric aliphatic or cycloaliphatic di(meth)acrylate having a molecular weight (MW) of not more than 800, b) 0-15 % by weight of a monomeric poly(meth)acrylate having a functionality of at least 3 and an MW of not more than 600, c) 0-20 % by weight of a mono(meth)acrylate or a mono-N-vinyl compound having an MW of not more than 500, d) 20-60 % by weight of a urethane (meth)acrylate having a functionality of 2 to 4 and an MW of 500 to 10,000, e) 10-50 % by weight of a monomeric or oligomeric di(meth)acrylate based on bisphenol A or bisphenol F, f) 0.1-10 % by weight of a photoinitiator and g) 0-5 % by weight of customary additives, the proportion of the components a) to g) together being 100 % by weight, are photosensitive mixtures which can be polymerized by means of actinic radiation and are preferentially suitable for the production of three-dimensional articles by means of the stereolithographic process.

Affiliated with

Also associated with

Rating

Photosensitive mixture does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive mixture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive mixture will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1429115