Plasma reactor with a deposition shield

Details Plasma reactor with a deposition shield Plasma reactor with a deposition shield

C - Chemistry, Metallurgy

23

C

C23C 16/00 (2006.01) C23C 14/56 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2312777

A reactor (20) includes a shield (50) which prevents the deposition, by for example, sputtering, of materials along a line-of-sight path from a wafer (26) toward and onto an electrode (32) or a window (38) which couples the electrode (32) to a reaction chamber of the reactor (20).

La présente invention se rapporte à un réacteur (20) constitué d'un blindage (50) empêchant la formation de dépôts dus par exemple au jaillissement de matériaux le long du trajet d'une ligne de vision, depuis une plaquette (26) jusqu'à la surface d'une électrode (32) ou d'une fenêtre couplant l'électrode (32) à une chambre de réaction du réacteur (20).

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