4. H - Electricity
  5. 01
  6. J

Tegal Corporation

H - Electricity – 01 – J

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Country: United States Of America

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A method for minimizing the critical dimension growth of a...

H - Electricity – 01 – L
Patent

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Flat magnetron sputter apparatus

H - Electricity – 01 – J
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Integrated semiconductor wafer processing system

H - Electricity – 01 – L
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Method and apparatus for etching a semiconductor wafer

H - Electricity – 01 – L
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Method and apparatus for increasing wafer throughput between...

C - Chemistry – Metallurgy – 23 – C
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Profile ID: LFCA-PAI-P-1367218

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