Positive type photoresist composition

Details Positive type photoresist composition Positive type photoresist composition

G - Physics

03

C

96/165

G03C 1/52 (2006.01) G03F 7/023 (2006.01)

Patent

CA 1250776

ABSTRACT OF THE DISCLOSURE A positive type photoresist composition comprising polyhydroxy-.alpha.-methylstyrene or a hydroxy-.alpha.-methylstyrene copolymer and as a photo-sensitizer a quinonediazide compound is disclosed. A positive type photoresist composition comprising polyhydroxy-.alpha.-methylstyrene or a hydroxy-.alpha.- methylstyrene copolymer, a novolak resin and as a photo- sensitizer a quinonediazide compound is also disclosed.

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