4. G - Physics
  5. 03
  6. F

Makoto Hanabata

G - Physics – 03 – F

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Inventor

Country: Japan

Novolak resin for positive photoresist

C - Chemistry – Metallurgy – 08 – G
Patent

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Positive type photoresist composition

G - Physics – 03 – C
Patent

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Positive type photoresist composition

G - Physics – 03 – F
Patent

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Radiation-sensitive positive resist composition

G - Physics – 03 – F
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Resist composition

G - Physics – 03 – C
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Profile ID: LFCA-PAI-P-1075494

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