G - Physics – 03 – C
Patent
G - Physics
03
C
96/158
G03C 1/56 (2006.01) G03F 7/022 (2006.01)
Patent
CA 2000552
-15- ABSTRACT OF THE DISCLOSURE A positive resist composition which comprises an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound, wherein (a) a pattern area corresponding to the quinone diazide sulfonic acid diester of the phenol compound having not less than three hydroxyl groups is not less than 40 % of all pattern areas corresponding to the sensitizer in a HPLC pattern measured with a primary detector using IR light having the wavelength of 254 nm, and (b) a pattern area corresponding to the complete ester of the phenol compound having not less than two hydro- xyl groups with the quinone diazide sulfonic acid is not less than 5 % and less than 60 % of all pattern areas corre- sponding to the sensitizer in the HPLC pattern, which compo- sition has high .gamma.-value and high film thickness retention.
Hanabata Makoto
Kuwana Koji
Nakanishi Hirotoshi
Oi Fumio
Uetani Yasunori
Kirby Eades Gale Baker
Sumitomo Chemical Co. Ltd.
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