G - Physics – 03 – F
Patent
G - Physics
03
F
96/165, 96/77
G03F 7/023 (2006.01)
Patent
CA 1255952
ABSTRACT OF THE DISCLOSURE A positive type photoresist composition com- prising a novolak resin and a quinonediazide compound, the novolak resin being one which is obtained by the addition condensation reaction of a phenol and formal- dehyde which is performed in one stage by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, or in two stages by using an acid catalyst in the subsequent stage, the phenol being at least one compound represented by the formula Image wherein R is hydrogen or an alkyl group of carbon number 1 to 4, the compound being such that the average carbon number in the substituent per one phenol nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol%, is disclosed. The positive type photoresist composition of the invention has an improved resolving power, i.e., .gamma.-value.
448523
Furuta Akihiro
Hanabata Makoto
Hiroaki Osamu
Jinno Naoyoshi
Yasui Seimei
Riches Mckenzie & Herbert Llp
Sumitomo Chemical Co. Ltd.
LandOfFree
Positive type photoresist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive type photoresist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive type photoresist composition will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1273066