G - Physics – 03 – F
Patent
G - Physics
03
F
96/165
G03F 7/004 (2006.01) G03F 7/022 (2006.01)
Patent
CA 1337626
The present invention is directed to a radiation sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali- soluble novolak resin which is obtained by condensing a phenol compound with formaldehyde, and a polyphenol of the formula (I): Image (I) wherein a, b, c, d, e and f are the same or different and represent a number of 0-3, provided that at least one of b, d and f is a number of 1-3; R1, R2 and R3 are the same or different and a C2-C18 alkyl group, a C1-C18 alkoxy group, a carboxyl group, a methoxycarbonyl group, an ethoxycarbonyl group or a halogen atom; R4 is a hydrogen atom, a C1-Cl8 alkyl group or a C6-C10 aryl group. The resist composition of the present invention is sensitive to radiation and has a good balance of sensitivity, resolving power and heat resistance.
604914
Hanabata Makoto
Hioki Takeshi
Oi Fumio
Osaki Haruyoshi
Uetani Yasunori
Kirby Eades Gale Baker
Sumitomo Chemical Co. Ltd.
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