C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/493, 204/43.
C07C 33/40 (2006.01) C07C 33/46 (2006.01) C07C 33/50 (2006.01) C07C 69/63 (2006.01) C25B 3/02 (2006.01)
Patent
CA 1331016
- 27 - Abstract of the Disclosure: Benzene derivatives of the general formula Image I where Hal is halogen, R1 is a hydrocarbon radical of 1 to 18 carbon atoms, R2 is hydrogen or alkyl of 1 to 6 carbon atoms and X is hydrogen or halogen, are prepared by a process in which a toluene derivative of the general formula Image II is electronically oxidized in the presence of an acid of the formula R2-COOH (III). Novel benzene derivatives of the general formula Image IV where R3 is hydrogen or an R2-CO- radical but R1 cannot be methyl if X is hydrogen, and of the general formula Image VI where R4 is a branched or cyclic alkyl radical of 3 to 12 carbon atoms, but R4 cannot be isopropyl if X is hydrogen.
602423
Degner Dieter
Goetz Norbert
Harreus Albrecht
Hermeling Dieter
Theobald Hans
Basf Aktiengesellschaft
Robic
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