C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
23/196
C01B 33/04 (2006.01) C07F 7/12 (2006.01)
Patent
CA 1238177
Abstract of the Disclosure A process for disproportionating silanes, which comprises contacting a silane having at least one Si-H bond represented by the general formula R?HmSiX4-(?+m) wherein R represents an alkyl or aryl group, X represents a halogen atom or an alkoxy group, ? is 0, 1 or 2, and m is 1, 2 or 3 and ?+m is 1, 2 or 3, and when ? is 2, R's may be identical or different, and when ?+m is 1 or 2, X's may be identical or different, with a reaction product of a strong acid-type cation exchange resin with an amine and disproportionating the silane.
511184
Abe Tomohiro
Inoue Kaoru
Itoh Masayoshi
Koizumi Kyogo
Miyagawa Hiroharu
Mitsui Chemicals Incorporated
Smart & Biggar
LandOfFree
Process for disproportionating silanes does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for disproportionating silanes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for disproportionating silanes will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1277939