Process for disproportionating silanes

C - Chemistry – Metallurgy – 01 – B

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C01B 33/04 (2006.01) C07F 7/12 (2006.01)

Patent

CA 1238177

Abstract of the Disclosure A process for disproportionating silanes, which comprises contacting a silane having at least one Si-H bond represented by the general formula R?HmSiX4-(?+m) wherein R represents an alkyl or aryl group, X represents a halogen atom or an alkoxy group, ? is 0, 1 or 2, and m is 1, 2 or 3 and ?+m is 1, 2 or 3, and when ? is 2, R's may be identical or different, and when ?+m is 1 or 2, X's may be identical or different, with a reaction product of a strong acid-type cation exchange resin with an amine and disproportionating the silane.

511184

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