Process for the germanium-doping of optical waveguide base...

Details Process for the germanium-doping of optical waveguide base... Process for the germanium-doping of optical waveguide base...

C - Chemistry, Metallurgy

03

B

117/85

C03B 37/02 (2006.01) C03B 37/014 (2006.01) C03C 13/04 (2006.01)

Patent

CA 1240569

PROCESS FOR THE GERMANIUM-DOPING OF OPTICAL WAVEGUIDE BASE MATERIAL BASED ON VITREOUS SILICA ABSTRACT OF THE DISCLOSURE A process is provided which permits the effective manufacture of optical waveguide base material that has been doped with germanium and is based on vitreous silica. According to the invention, silicon chlorides of the formula SinCl2n+2, in which "n" is an integer from 2 to 6 especially hexachlorodi- silane, are used as glass-formers in the presence of oxygen and germanium tetrachloride at temperatures of from 1100 - 1600°C.

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