Process for the preparation of the parylene dimer

Details Process for the preparation of the parylene dimer Process for the preparation of the parylene dimer

C - Chemistry, Metallurgy

07

C

260/680.5

C07C 1/32 (2006.01) C07C 13/70 (2006.01)

Patent

CA 1282434

ABSTRACT OF THE DISCLOSURE An improved process is provided for the preparation of the dimer, 2,2-paracyclophane, which is useful as the starting material for parylene conformal coatings used in the electronics industry for the protection of various sensitive electronic components. The process comprises optimization of the normally low yield of dimer formed by the Hofmann elimination reaction of p-methylbenzyltrimethyl- ammonium halide by conducting the elimination reaction in the presence of dimethylsulfoxide and certain reaction promoters.

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