Process of etching glass surfaces, particularly in the...

Details Process of etching glass surfaces, particularly in the... Process of etching glass surfaces, particularly in the...

C - Chemistry, Metallurgy

03

C

149/17

C03C 15/00 (2006.01) C03B 37/018 (2006.01)

Patent

CA 1163176

ABSTRACT A process of etching surfaces of silica glass or silicate glass with hydrogen fluoride is described wherein the hydrogen fluoride is produced by a chemical vapor-phase reaction carried out within a localized heating zone in the proximity of the surface to be etched. The process is particularly useful in the course of preparing the interior surface of a substrate tube to be coated for the manufacture of optical waveguides.

368153

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