C - Chemistry – Metallurgy – 02 – F
Patent
C - Chemistry, Metallurgy
02
F
134/39
C02F 5/14 (2006.01) C23F 11/08 (2006.01) C23F 11/167 (2006.01)
Patent
CA 1326429
ABSTRACT A process of inhibiting undesirable manganese deposition in water conducting systems which contain manganese at concentrations and under conditions such that the manganese will tend to precipitate as an insoluble compound, the improvement which comprises adding to said water an organic aminophosphonic acid, wherein the nitrogen and phosphorus are interconnected by an alkylene or substituted alkylene radical, and having the formula Image (I) wherein substituents A, B, C, D, E, and F are independently hydrogen, -CH2PO3H2, or Image or salts of the phosphonic acid radical; wherein X and Y are independently hydrogen, methyl or ethyl radicals; n is 2 or 3; and m and m' each is 0-10; with the proviso that more than 50 percent of the amine hydrogens have been substituted by a phosphorus- containing group; and wherein R is a hydrocarbon residue which can be a linear, branched, cyclic, heterocyclic or substituted heterocyclic structure; with the further proviso that when m or m'? the E and F substituents may be the same as or different from any other substituent of any other nitrogen atom and each R can be the same as or different from any other R.
561223
Crump Druce K.
Grierson Jeffrey Gordon
Wilson David Alan
Smart & Biggar
The Dow Chemical Company
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