C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/315.3, 71/8.
C07D 231/10 (2006.01) A01N 43/56 (2006.01) A01N 47/08 (2006.01) A01N 47/18 (2006.01) A01N 47/36 (2006.01) C07D 231/12 (2006.01) C07D 231/16 (2006.01) C07D 231/38 (2006.01) C07D 231/40 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1274834
NEW PYRAZOLE DERIVATIVES, THEIR PRODUCTION AND USES ABSTRACT OF THE DISCLOSURE As new compounds is provided a pyrazole derivative of the formula (I) Image wherein R1a, R1b and R1C are each a hydrogen atom, a halogen atom, a nitro group, an amino group, a (lower) alkyl group, a halo-(lower)alkyl group, a (lower)alkenyl group, a (lower)alkynyl group, a (lower)alkylcarbonylamino group, a (lower)alkoxycarbonylamino group, a mono-(lower) alkylaminocarbonylamino group or a di-(lower)alkylamino- carbonylamino group; R2 is a hydrogen atom, a (lower)alkyl group, a (lower)alkenyl group, a (lower)alkynyl group, a (lower) alkoxy(lower)alkyl group, a (lower)alkylthio(lower)alkyl group, a (lower)alkylcarbonyl(lower)alkyl group, a (lower) alkoxycarbonyl(lower)alkyl group, a (lower)alkylthio- carbonyl(lower)alkyl group, a cyano(lower)alkyl group, a (lower)alkylsulfonyl group, phenylsulfonyl group, a halogen-substituted phenylsulfonyl group or a (lower) alkyl-substituted phenylsulfonyl group, and X and Y are the same or different and each are a halogen atom. The pyrazoles are useful as herbicidal agent and may be produced by a variety of processes.
508852
Ohyama Hiroshi
Ono Toshiharu
Shimozono Takuro
Terakawa Teruhiko
Hokko Chemical Industry Co. Ltd.
Macrae & Co.
Ohyama Hiroshi
Ono Toshiharu
Shimozono Takuro
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