C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/211, 260/254
C07D 239/95 (2006.01) C07D 239/96 (2006.01) C07D 285/24 (2006.01) C07D 401/06 (2006.01) C07D 409/06 (2006.01)
Patent
CA 1289139
ABSTRACT OF THE DISCLOSURE Quinazoline derivatives of the formula: Image in which R1 and R2 are each hydrogen, halogen, lower alkoxy or halo(lower)alkyl, R3 is aryl or ar(lower)alkyl, both of which may have one or more suitable sub- stituent(s), or heterocyclic(lower)alkyl, R4 is carboxy or protected carboxy, A is oxygen or sulfur atom, Y is carbonyl, thiocarbonyl or sulfonyl and Z is lower alkylene, and pharmaceutically acceptable salts thereof, exhibit an aldose reductase-inhibitory activity and may be used in the therapeutic treatment of diabetic complications, for example corneal wound healing defects
519759
Baba Yukihisa
Hashimoto Masashi
Ito Yoshikuni
Kasahara Chiyoshi
Namiki Takayuki
Fujisawa Pharmaceutical Co. Ltd.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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