Radiation-sensitive positive-working mixture

Details Radiation-sensitive positive-working mixture Radiation-sensitive positive-working mixture

G - Physics

03

F

96/172

G03F 7/039 (2006.01) G03F 7/027 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2023660

O.Z. 0050/41049 Abstract of the Disclosure: A radiation-sensitive positive-working mixture is composed of (a) an ethylenically unsaturated reaction product containing urea and urethane groups, (b) at least one organic compound containing one or more carboxyl groups, (c) an optional photoinitiator or photoinitiator system with or without (d) further additives and auxiliaries.

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