C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
167/103.05, 530/
C07K 5/08 (2006.01) C07D 233/54 (2006.01) C07K 5/02 (2006.01) C07K 5/06 (2006.01) C07K 5/065 (2006.01) A61K 38/00 (2006.01)
Patent
CA 1307622
HOE 86/F 202J Abstract of the disclosure The invention relates to compounds of the formula Image in which R1 is absent or denotes hydrogen, alkyl or acyl, A denotes an acyl radical or an amino acid residue, B denotes an amino acid residue, and R2, R3 and R4 are as defined in the specification, and to their salts, to a process for their preparation, to pharmaceutical prod- ucts containing them, and to their use as medicaments, and intermediates for the preparation of these compounds.
543282
Kleemann Heinz-Werner
Ruppert Dieter
Scholkens Bernward
Wagner Adalbert
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Hoechst Aktiengesellschaft
Kleemann Heinz-Werner
Ruppert Dieter
Scholkens Bernward
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