Resin system

C - Chemistry – Metallurgy – 08 – G

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C08G 59/32 (2006.01) C08G 59/38 (2006.01) C08G 59/42 (2006.01) C09D 163/00 (2006.01) H01B 3/40 (2006.01) H01B 7/00 (2006.01) H01B 13/00 (2006.01)

Patent

CA 2334824

The resin system comprises at least two components which can be stored separately and crosslinked with one another at room temperature, preferably without curing accelerators. The first component comprises at least one compound of the formula (I) (see formula I) where A is an unsubstituted or substituted aromatic radical. The second component comprises at least one cyclic anhydride of an organic acid. However, the compound of the formula (I) here is not a compound of the formula (II) (see formula II) where m = 1 or 2, if the cyclic anhydride is a compound of the formula (III) (see formula III) where A is a carbonyl radical, or has the formula (see formula IV) where each radical R o is a hydrogen atom or halogen atom, a hydroxyl radical or a C1-C5-alkyl radical or an alkoxy radical, or a C1-C5-alkyl-substituted oxycarbonyl radical, and R' and R", independently of one another, are hydrogen atoms or halogen atoms, C1-C5-alkyl groups, nitro groups, carboxyl groups, sulfonyl groups or amino groups.

L'invention concerne un système résine contenant au moins deux composantes susceptibles de stockage et réticulables ensemble, de préférence, sans accélérateur de durcissement à température ambiante. La première composante contient au moins un composé de la formule générale (I) où A représente un reste aromatique éventuellement substitué. La deuxième composante contient au moins un anhydride cyclique d'un acide organique. Toutefois, le composé de la formule (I) n'est pas un composé de la formule (II) où m vaut 1 ou 2 si l'anhydride cyclique représente un composé de la formule (III), où A représente un reste carbonyle, ou bien de la formule (IV), où chaque reste R<o> représente individuellement un atome d'hydrogène ou d'halogène, un reste hydroxy ou alkyle C1-C5 ou un reste alcoxy ou un reste oxocarbonyle substitué par un groupe alkyle C1-C5, et R' et R'' représentent, indépendamment l'un de l'autre, des atomes d'hydrogène ou d'halogène, des groupes alkyle C1-C5, nitro, carboxyle, sulfonyle ou amino.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Resin system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resin system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resin system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1664112

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.