Resist developing apparatus

Details Resist developing apparatus Resist developing apparatus

G - Physics

03

F

95/88

G03F 7/26 (2006.01) G03F 7/30 (2006.01)

Patent

CA 1277861

Abstract of the Disclosure A resist developing apparatus comprising a developing tank consisting of a top portion, a body portion, and a bottom portion, at least one of the top, body, and bottom portions being comprised of an inner wall and an outer wall, a heat exchange chamber being defined between the inner and outer walls for being supplied with a heating medium; a chuck disposed inside the developing tank for holding a work piece in position, a nozzle for spraying chemical liquid toward the work piece held in position by the chuck; a heating medium supply unit for supplying heating medium at a specified temperature to the heat exchange chamber; and piping connecting between the heating medium supply unit and the heat exchange chamber, whereby the interior of the developing tank is adapted to be controlled to a specified temperature.

524014

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