Resist development control system

Details Resist development control system Resist development control system

G - Physics

03

F

356/142

G03F 7/00 (2006.01) G03F 7/30 (2006.01)

Patent

CA 1085968

RESIST DEVELOPMENT CONTROL SYSTEM Abstract of the Disclosure In the process of developing exposed photoresist on a substrate, the endpoint in developing away all of the exposed positive photoresist or any other positive resist is detected by exposing a wafer with a predetermined pattern including an optical grating or other special pattern formed in the photoresist upon a test area. In a system employing this concept, a beam is diffracted by the optics of the grating only at a first angle until the resist forming the grating is removed by development. Then a sensor is activated when an angle of reflection is unblocked when the grating dis- appears. The system is then turned off to stop development by the sensor in an automatic system or, by the operator in a manual system. A double exposure technique is employed to produce the grating or other special pattern.

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