Semiconductor device and method of manufacturing the same

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H01L 31/04 (2006.01) H01L 31/0216 (2006.01) H01L 31/0224 (2006.01) H01L 31/18 (2006.01) H01L 31/20 (2006.01)

Patent

CA 1232051

ABSTRACT OF THE DISCLOSURE A semiconductor device such as a solar cell, photodiode and solid state imaging device comprises a semiconductor layer made of amorphous silicon formed on a given substrate, and a transparent conductive layer formed by an interracial reaction between the amorphous silicon and a metallic film directly formed on the amorphous silicon. This transparent conductive layer is used as a transparent electrode of the device and if necessary the remainder after having partially removed the metallic film for the transparent conductive layer is used as a conductive layer and right shielding film.

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