Semiconductor wafer processing system with...

G - Physics – 03 – D

Patent

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Details

G03D 5/00 (2006.01) C23C 16/54 (2006.01) H01L 21/00 (2006.01) H01L 21/31 (2006.01) H01L 21/677 (2006.01) H01L 21/687 (2006.01)

Patent

CA 2369042

A semiconductor wafer processing system including a multi-chamber module having vertically-stacked semiconductor wafer process chambers and a loadlock chamber dedicated to each semiconductor wafer process chamber. Each process chamber includes a chuck for holding a wafer during wafer processing. The multi-chamber modules may be oriented in a linear array. The system further includes an apparatus having a dual-wafer single-axis transfer arm including a monolithic arm pivotally mounted within said loadlock chamber about a single pivot axis. The apparatus is adapted to carry two wafers, one unprocessed and one processed, simultaneously between the loadlock chamber and the process chamber. A method utilizing the disclosed system is also provided.

L'invention concerne un système de traitement de tranches de semi-conducteur comprenant un module multichambre présentant des chambres de traitement de tranches de semi-conducteur empilées verticalement ainsi qu'une chambre à sas de charge exclusif à chaque chambre de traitement de tranches de semi-conducteur. Chaque chambre de traitement comprend un mandrin destiné à maintenir une tranche pendant le traitement. Les modules multichambres peuvent être orientés en une rangée linéaire. Le système comprend également un appareil présentant un bras de transfert monoaxe à deux tranches comprenant un bras monolythique monté pivotant à l'intérieur de ladite chambre à sas de charge, autour d'un seul axe de pivot. L'appareil est adapté pour porter deux tranches, une non traitée et une traitée simultanément entre la chambre à sas de charge et la chambre de traitement. L'invention concerne également un procédé utilisant le système décrit.

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