Sio2 slurry for the production of quartz glass and use of...

C - Chemistry – Metallurgy – 03 – B

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C03B 19/06 (2006.01) G02B 5/02 (2006.01) C03C 17/02 (2006.01) H05B 3/00 (2006.01)

Patent

CA 2664542

A known SiO2 slurry for the production of quartz glass contains a dispersion liquid and amorphous SiO2 particles with particle sizes to a maximum of 500µm, wherein the largest volume fraction is composed of SiO2 particles with particle sizes in the range 1µm - 60µm, as well as SiO2 nanoparticles with particle sizes less than 100nm in the range 0.2 - 15% volume by weight (of the entire solids content). In order to prepare such a slurry for use, and to optimize the flow behavior of such a slurry with regard to later processing by dressing or pouring the slurry mass, and with regard to later drying and sintering without cracks, the invention suggests a slurry with SiO2 particles with a multimodal distribution of particle sizes, with a first maximum of the sizes distribution in the range 1µm - 3µm and a second maximum in the range 5µm - 50µm, and a solids content (percentage by weight of the SiO2 particles and the SiO2 nanoparticles together) in the range 83% - 90%.

Selon l'invention, une barbotine connue de SiO2 destinée à fabriquer du verre au quartz contient un liquide de dispersion et des particules amorphes de SiO2 dont la granulométrie est d'au plus 500 µm. Les particules de SiO2 dont la granulométrie est comprise entre 1 µm et 60 µm constituent la plus grande partie du volume et en outre des nanoparticules de SiO2 dont la granulométrie est inférieure à 100 nm en constituent de l'ordre de 0,2 % en poids à 15 % en poids (par rapport à la teneur totale en solides). Pour, partant de là, réaliser une barbotine dont le comportement d'écoulement est optimisé en particulier en termes de traitement par extraction ou coulée de la pâte de barbotine et en termes de séchage et de frittage exempts de fissure, l'invention propose que les particules de SiO2 présentent une répartition granulométrique multimodale avec un premier maximum de la répartition granulométrique entre 1 et 3 µm et un deuxième maximum entre 5 et 50 µm et que la teneur en solides (proportion pondérale des particules de SiO2 et des nanoparticules de SiO2) soit comprise entre 83 et 90 %.

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